Sputtering targets

Advanced alloy targets, ultrafine grain alloy targets, Japanese quality
Sputtering targets

Sputtering is used extensively in the semiconductor, hard drive, flat panel display, optical and photovoltaic to deposit thin film layers. It is a proven technology capable of depositing a wide variety of materials on to diverse substrate shapes and sizes.

Materials science and target design are becoming very important as the global demand for lower cost of ownership and high production yields forces target manufacturers to develop more innovative materials of the highest quality.

Kuroda Electric offers new range of patented alloys that has been designed to overcome major flaws of pure materials such as necessity for adhesion and passivation layers, while keeping their core advantages for reasonable pricing. These advanced alloys are truly a cost effective solution and can replace existing materials such as Al, Ag, Cu or Au.

Sputtering targets